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Future of Semiconductor Lasing: Topological Insulator Lasers

February 11, 2018

Future of Semiconductor Lasing: Topological Insulator Lasers | Technion - Israel Institute of Technology<img height="1" width="1" style="display:none" src="https://www.facebook.com/tr?id=1719827438239091&ev=PageView&noscript=1" />

Applying topological physics to lasing creates more highly efficient and robust lasers

Haifa, Israel February 1, 2018 –Israeli and US researchers have developed a new highly efficient coherent and robust semiconductor laser system: the topological insulator laser.

The findings are presented in two new joint research papers, one describing theory and the other experiments, published online by the prestigious journal Science on Thursday, February 1.

 

 

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